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METHOD TO ENHANCE FORMATION OF NANO-FEATURES IN SOFT LITHOGRAPHY

Description:
Soft lithography uses a patterned elastomer polydimethylsiloxane (PDMS) as the stamp or mold to generate micro- and nano-patterns.  This method is limited for features smaller than 100 nm, as the low modulus PDMS may deform and result in pattern collapse and rounded corners.  Penn scientists have developed a novel method to form sub-100nm features on nano-patterned thin films of PDMS that takes advantage of the ability of PDMS to be distorted by solvents, mechanical forces, and heat in a controlled and predictable fashion. 

IP Status:
Issued US patent(s):  8,530,689

References:
Y. Zhang et al., Nano Letters, 8, 1192 (2008)


Patent Information:
For Information, Contact:
Pamela Beatrice
Director, SEAS/SAS Licensing Group
University of Pennsylvania
215-573-4513
beatricp@upenn.edu
Inventors:
Shu Yang
Ying Zhang
Randall Kamien
James Kikkawa
Dinesh Chandra
Elisabetta Matsumoto
Keywords: