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Search Results - dinesh chandra

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Method to enhance formation of nano-features in soft lithography
Technology Overview: Soft lithography uses a patterned elastomer polydimethylsiloxane (PDMS) as the stamp or mold to generate micro- and nano-patterns. This method is limited for features smaller than 100 nm, as the low modulus PDMS may deform and result in pattern collapse and rounded corners. Penn scientists have developed a novel method to form...
Published: 3/9/2020   |   Inventor(s): Shu Yang, Ying Zhang, Randall Kamien, James Kikkawa, Dinesh Chandra, Elisabetta Matsumoto
Category(s): Research Tools & Reagents